Gr2 Titanium Tabular Target
Gr2 Titanium Tabular Target
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   CXMET specializes in producing Gr2 Titanium Tabular Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. 


  The material for our sputtering targets are titanium, nickel, tungsten, molybnum, tantalum, niobium, zirconium, 

hafnium and their alloy, like Ti-Al alloy, Cr-Al alloy, Ni-Cr alloy, Cr-Al alloy, etc. 


  Titanium target mainly processed as Gr2 Titanium Tabular Target, titanium columnar target, titanium tubular target.


titanium tubular target (3)


   All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP).


  Chemical for Gr2 Titanium Tabular Target


N

C

H

Fe

O

Al

V

Pd

Mo

Ni

Ti

Gr 1

0.03

0.08

0.015

0.20

0.18

/

/

/

/

/

bal

Gr 2

0.03

0.08

0.015

0.30

0.25

/

/

/

/

/

bal

Gr 5

0.05

0.08

0.015

0.40

0.20

5.5~6.75

3.5~4.5

/

/

/

bal

Gr 7

0.03

0.08

0.015

0.30

0.25

/

/

0.12~0.25

/

/

bal

Gr 9

0.03

0.08

0.015

0.25

0.15

2.5~3.5

2.0~3.0

/

/

/

bal

Gr12

0.03

0.08

0.015

0.30

0.25

/

/

/

0.2~0.4

0.6~0.9

bal




titanium tubular target (2)

  CXMET in mainly processing many kinds of target.


  Material are titanium, nicekl, Ti-Ni alloy, Ti-Al alloy, tantalum, niobium, tungsten, molybdenum, zirconium, chronium, Ti-Ta alloy, Ni-Cr alloy, etc. 

 

  Shape are round target, circle target, plate target, planner target, tube target, tubuler target, U-turn targts, tapered target, etc. 


  For the targets, CXMET have many for you to choose. 




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